Toward High-Performance Top-Gate Ultrathin HfS2 Field-Effect Transistors by Interface Engineering
- K. Xu
- , Y. Huang
- , B. Chen
- , Y. Xia
- , Wen Lei
- , Z. Wang
- , Q. Wang
- , F. Wang
- , L. Yin
- , J. He
Research output: Contribution to journal › Article › peer-review
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