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Toward High-Performance Top-Gate Ultrathin HfS2 Field-Effect Transistors by Interface Engineering

  • K. Xu
  • , Y. Huang
  • , B. Chen
  • , Y. Xia
  • , Wen Lei
  • , Z. Wang
  • , Q. Wang
  • , F. Wang
  • , L. Yin
  • , J. He

    Research output: Contribution to journalArticlepeer-review

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