Thin Photo-Patterned Micropolarizer Array for CMOS Image Sensors

X. Zhao, Farid Boussaid, A. Bermak, V.G. Chigrinov

    Research output: Contribution to journalArticlepeer-review

    82 Citations (Scopus)


    We fabricated and characterized a thin photo-patterned micropolarizer array for complementarymetal–oxide–semiconductor (CMOS) image sensors. Theproposed micropolarizer fabrication technology completelyremoves the need for complex selective etching. Instead, it uses thewell-controlled process of ultraviolet photolithography to definemicropolarizer orientation patterns on a spin-coated azo-dye-1film. The patterned polymer film micropolarizer (10 m 10 m)exhibits submicron thickness (0.3 m) and has an extinction ratioof 100. Reported experimental results validate the concept of a thin, high spatial resolution, low-cost photo-patterned micropolarizer array for CMOS image sensors.
    Original languageEnglish
    Pages (from-to)805-807
    JournalIEEE Photonics Technology Letters
    Issue number12
    Publication statusPublished - 2009


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