We fabricated and characterized a thin photo-patterned micropolarizer array for complementarymetal–oxide–semiconductor (CMOS) image sensors. Theproposed micropolarizer fabrication technology completelyremoves the need for complex selective etching. Instead, it uses thewell-controlled process of ultraviolet photolithography to definemicropolarizer orientation patterns on a spin-coated azo-dye-1film. The patterned polymer film micropolarizer (10 m 10 m)exhibits submicron thickness (0.3 m) and has an extinction ratioof 100. Reported experimental results validate the concept of a thin, high spatial resolution, low-cost photo-patterned micropolarizer array for CMOS image sensors.