Thin Film Materials Characterization Using TE Modes Cavity

Jean-Michel Le Floch; F. Houndonougbo; V. Madrangeas; D. Cros; M. Guilloux-Viry; W. Peng

doi:10.1163/156939309787612293

Thin Film Materials Characterization Using TE Modes Cavity

Jean-Michel Le Floch, F. Houndonougbo, V. Madrangeas, D. Cros, M. Guilloux-Viry, W. Peng

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20 Citations (Scopus)

Abstract

This paper presents the characterization of thin film dielectric materials, labeled as LW 51 KTN and LW 48 KTN. The technique can be applied for lower temperatures. We briefly present the material process of both thin films, then the dielectric characterization using a conventional TE mode cavity method [1-5] with the help of a rigorous simulation software based on the method of lines [6]. We finally measured high permittivity and low loss-tangent materials within the microwave frequency range from 12 to 15 GHz.

Original language	English
Pages (from-to)	549-559
Journal	Journal of Electromagnetic Waves and Applications
Volume	23
Issue number	4
DOIs	https://doi.org/10.1163/156939309787612293
Publication status	Published - 2009

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title = "Thin Film Materials Characterization Using TE Modes Cavity",

abstract = "This paper presents the characterization of thin film dielectric materials, labeled as LW 51 KTN and LW 48 KTN. The technique can be applied for lower temperatures. We briefly present the material process of both thin films, then the dielectric characterization using a conventional TE mode cavity method [1-5] with the help of a rigorous simulation software based on the method of lines [6]. We finally measured high permittivity and low loss-tangent materials within the microwave frequency range from 12 to 15 GHz.",

author = "{Le Floch}, Jean-Michel and F. Houndonougbo and V. Madrangeas and D. Cros and M. Guilloux-Viry and W. Peng",

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AU - Le Floch, Jean-Michel

AU - Houndonougbo, F.

AU - Madrangeas, V.

AU - Cros, D.

AU - Guilloux-Viry, M.

AU - Peng, W.

PY - 2009

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AB - This paper presents the characterization of thin film dielectric materials, labeled as LW 51 KTN and LW 48 KTN. The technique can be applied for lower temperatures. We briefly present the material process of both thin films, then the dielectric characterization using a conventional TE mode cavity method [1-5] with the help of a rigorous simulation software based on the method of lines [6]. We finally measured high permittivity and low loss-tangent materials within the microwave frequency range from 12 to 15 GHz.

U2 - 10.1163/156939309787612293

DO - 10.1163/156939309787612293

M3 - Article

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EP - 559

JO - Journal of Electromagnetic Waves and Applications

JF - Journal of Electromagnetic Waves and Applications

SN - 0920-5071

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ER -

Thin Film Materials Characterization Using TE Modes Cavity

Abstract

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