Thermal Stability of PECVD SiN/sub x/ Films: 2006 International Conference on Nanoscience and Nanotechnology

N. Jehanathan; Y. Liu; B. Walmsley; J. Dell; L. Faraone

doi:10.1109/ICONN.2006.340554

Thermal Stability of PECVD SiN/sub x/ Films: 2006 International Conference on Nanoscience and Nanotechnology

N. Jehanathan, Y. Liu, B. Walmsley, J. Dell, L. Faraone

Research output: Chapter in Book/Conference paper › Conference paper › peer-review

1 Citation (Scopus)

Abstract

This study investigates the effect of oxidation on the structural integrity of PECVD SiN_x thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentation measurement. It is found the heating to elevated temperatures results in the replacement of the nitrogen content in the films by oxygen, implying an oxidation process. SEM examination revealed that the surface of the films is severely damaged, mostly in the form of circular in-plane cracks, as a result of the oxidation heating. This in turn leads to high scattering of the nanoindentation measurement of mechanical properties

Original language	English
Title of host publication	Proceedings of 2006 International Conference on Nanoscience and Nanotechnology ICONN 2006
Publisher	IEEE, Institute of Electrical and Electronics Engineers
Pages	76-79
DOIs	https://doi.org/10.1109/ICONN.2006.340554
Publication status	Published - 2006
Event	2006 International Conference on Nanoscience and Nanotechnology, ICONN 2006 - Brisbane, Australia Duration: 3 Jul 2006 → 6 Jul 2006 http://www.ausnano.net/iconn2006/

Conference

Conference	2006 International Conference on Nanoscience and Nanotechnology, ICONN 2006
Abbreviated title	ICONN 2006
Country/Territory	Australia
City	Brisbane
Period	3/07/06 → 6/07/06
Other	The aim of the 2006 International Conference On Nanoscience and Nanotechnology (ICONN 2006) is to bring together the Australian and International community (students, scientists and engineers from academia, govt. laboratories and industry) working in the field of nanoscale science and technology to discuss new and exciting advances in the field. ICONN will cover nanostructure growth, synthesis, fabrication, characterization, device design, modeling, fabrication, testing and applications. The conference will feature plenary talks followed by technical symposia (parallel sessions) consisting of invited talks, oral and poster presentations on the following topics. Nanomaterials including Nanocrystals, Nanotubes (carbon and inorganic), Nanowires Bio-Nanotechnology, Nano-Medicine and Nanobionics Nanoelectronics, Spintronics, Nano-Magnetics, Quantum computing Molecular and Organic Electronics, Organic Displays Nano-Optics, Nano-Optoelectronics, Nano-Photonics Nano-membranes, Nano-porous and Electrochemical Materials Nano-fabrication, Nano-lithography, Nano-manipulation Nanoscale Characterisation, Nano-imaging Computational Nanotechnology (Modelling and Simulation of Nanostructures) Nano-MEMS, Nano-Fluidics, Nano-Actuators, Nano-Sensors, Nano-Robotics, NanoSystems Nano-Manufacturing, Reliability, Standards, Safety and Ethical issues Education, Training and Skills in Nanotechnology
Internet address	http://www.ausnano.net/iconn2006/

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10.1109/ICONN.2006.340554

Cite this

Jehanathan, N., Liu, Y., Walmsley, B., Dell, J., & Faraone, L. (2006). Thermal Stability of PECVD SiN/sub x/ Films: 2006 International Conference on Nanoscience and Nanotechnology. In Proceedings of 2006 International Conference on Nanoscience and Nanotechnology ICONN 2006 (pp. 76-79). IEEE, Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/ICONN.2006.340554

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title = "Thermal Stability of PECVD SiN/sub x/ Films: 2006 International Conference on Nanoscience and Nanotechnology",

abstract = "This study investigates the effect of oxidation on the structural integrity of PECVD SiNx thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentation measurement. It is found the heating to elevated temperatures results in the replacement of the nitrogen content in the films by oxygen, implying an oxidation process. SEM examination revealed that the surface of the films is severely damaged, mostly in the form of circular in-plane cracks, as a result of the oxidation heating. This in turn leads to high scattering of the nanoindentation measurement of mechanical properties",

keywords = "cracks, Fourier transform spectroscopy, indentation, infrared spectroscopy, oxidation, plasma CVD, scanning electron microscopy, silicon compounds, thermal stability, thin films, This study investigates the effect of oxidation on the structural integrity of PECVD SiN<sub>x</sub> thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentation measurement. It is found the heating to elevated temperatures results in the replacement of the nitrogen content in the films by oxygen, implying an oxidation process. SEM examination revealed that the surface of the films is severely damaged,, SiN, Thermal stability, Silicon compounds, Oxidation, Scanning electron microscopy, Temperature, Heating, Transistors, Fourier transforms, Infrared spectra, Nitrogen",

author = "N. Jehanathan and Y. Liu and B. Walmsley and J. Dell and L. Faraone",

year = "2006",

doi = "10.1109/ICONN.2006.340554",

language = "English",

pages = "76--79",

booktitle = "Proceedings of 2006 International Conference on Nanoscience and Nanotechnology ICONN 2006",

publisher = "IEEE, Institute of Electrical and Electronics Engineers",

address = "United States",

note = "2006 International Conference on Nanoscience and Nanotechnology, ICONN 2006, ICONN 2006 ; Conference date: 03-07-2006 Through 06-07-2006",

url = "http://www.ausnano.net/iconn2006/",

}

Jehanathan, N, Liu, Y, Walmsley, B, Dell, J & Faraone, L 2006, Thermal Stability of PECVD SiN/sub x/ Films: 2006 International Conference on Nanoscience and Nanotechnology. in Proceedings of 2006 International Conference on Nanoscience and Nanotechnology ICONN 2006. IEEE, Institute of Electrical and Electronics Engineers, pp. 76-79, 2006 International Conference on Nanoscience and Nanotechnology, ICONN 2006, Brisbane, Australia, 3/07/06. https://doi.org/10.1109/ICONN.2006.340554

Thermal Stability of PECVD SiN/sub x/ Films: 2006 International Conference on Nanoscience and Nanotechnology. / Jehanathan, N.; Liu, Y.; Walmsley, B. et al.
Proceedings of 2006 International Conference on Nanoscience and Nanotechnology ICONN 2006. IEEE, Institute of Electrical and Electronics Engineers, 2006. p. 76-79.

Research output: Chapter in Book/Conference paper › Conference paper › peer-review

TY - GEN

T1 - Thermal Stability of PECVD SiN/sub x/ Films

T2 - 2006 International Conference on Nanoscience and Nanotechnology, ICONN 2006

AU - Jehanathan, N.

AU - Liu, Y.

AU - Walmsley, B.

AU - Dell, J.

AU - Faraone, L.

PY - 2006

Y1 - 2006

N2 - This study investigates the effect of oxidation on the structural integrity of PECVD SiNx thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentation measurement. It is found the heating to elevated temperatures results in the replacement of the nitrogen content in the films by oxygen, implying an oxidation process. SEM examination revealed that the surface of the films is severely damaged, mostly in the form of circular in-plane cracks, as a result of the oxidation heating. This in turn leads to high scattering of the nanoindentation measurement of mechanical properties

AB - This study investigates the effect of oxidation on the structural integrity of PECVD SiNx thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentation measurement. It is found the heating to elevated temperatures results in the replacement of the nitrogen content in the films by oxygen, implying an oxidation process. SEM examination revealed that the surface of the films is severely damaged, mostly in the form of circular in-plane cracks, as a result of the oxidation heating. This in turn leads to high scattering of the nanoindentation measurement of mechanical properties

KW - cracks

KW - Fourier transform spectroscopy

KW - indentation

KW - infrared spectroscopy

KW - oxidation

KW - plasma CVD

KW - scanning electron microscopy

KW - silicon compounds

KW - thermal stability

KW - thin films

KW - This study investigates the effect of oxidation on the structural integrity of PECVD SiN<sub>x</sub> thin films at elevated temperatures in dry air, by means of scanning electron microscopy (SEM), Fourier transform infrared spectroscopy and nanoindentatio

KW - SiN

KW - Thermal stability

KW - Silicon compounds

KW - Oxidation

KW - Scanning electron microscopy

KW - Temperature

KW - Heating

KW - Transistors

KW - Fourier transforms

KW - Infrared spectra

KW - Nitrogen

U2 - 10.1109/ICONN.2006.340554

DO - 10.1109/ICONN.2006.340554

M3 - Conference paper

SP - 76

EP - 79

BT - Proceedings of 2006 International Conference on Nanoscience and Nanotechnology ICONN 2006

PB - IEEE, Institute of Electrical and Electronics Engineers

Y2 - 3 July 2006 through 6 July 2006

ER -

Thermal Stability of PECVD SiN/sub x/ Films: 2006 International Conference on Nanoscience and Nanotechnology

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