TY - JOUR
T1 - The Corbino Pseudo-MOSFET on SOI: Measurements, Model, and Applications
AU - Cristoloveanue, S.
AU - Chandrasekhar Rao, T.V.
AU - Nguyen, Q.T.
AU - Antoszewski, Jarek
AU - Hovel, H.
AU - Gentil, P.
AU - Faraone, Lorenzo
PY - 2009
Y1 - 2009
N2 - We propose the combination of magnetoresistance(MR) and Pseudo-MOSFET (Ψ-MOSFET) measurements as animproved method for the characterization of silicon-on-insulator(SOI) materials. Measurements were performed on ultrathin SOIΨ-MOSFETs with Corbino geometry by applying high magneticfield and substrate biasing. Severalmodels and extraction methodsare developed and compared for an accurate evaluation of electronmobility. In particular, the series resistance effect is removed byusing appropriate corrections. The MR mobility can be determinedat low or variable electric field. The MR mobility behavioris investigated as a function of effective electric field, temperature,and film thickness. The correlation between the MR mobility andeffective mobility, determined in Ψ-MOSFETs at zero magneticfield, enables a detailed analysis of the electron transport andscattering mechanisms in the silicon thin film.
AB - We propose the combination of magnetoresistance(MR) and Pseudo-MOSFET (Ψ-MOSFET) measurements as animproved method for the characterization of silicon-on-insulator(SOI) materials. Measurements were performed on ultrathin SOIΨ-MOSFETs with Corbino geometry by applying high magneticfield and substrate biasing. Severalmodels and extraction methodsare developed and compared for an accurate evaluation of electronmobility. In particular, the series resistance effect is removed byusing appropriate corrections. The MR mobility can be determinedat low or variable electric field. The MR mobility behavioris investigated as a function of effective electric field, temperature,and film thickness. The correlation between the MR mobility andeffective mobility, determined in Ψ-MOSFETs at zero magneticfield, enables a detailed analysis of the electron transport andscattering mechanisms in the silicon thin film.
UR - https://www.scopus.com/pages/publications/62749143452
U2 - 10.1109/TED.2008.2011573
DO - 10.1109/TED.2008.2011573
M3 - Article
SN - 0018-9383
VL - 56
SP - 474
EP - 482
JO - IEEE Transactions on Electron Devices
JF - IEEE Transactions on Electron Devices
IS - 3
ER -