Temperature Cycling for Photoresist Processing

Y. Wang, Hui Chua, A. Tay, Z.P. Fang

Research output: Chapter in Book/Conference paperConference paper

1 Citation (Scopus)
Original languageEnglish
Title of host publicationProceedings of the 17th World Congress (IFAC)
EditorsMyung Jin Chung, Pradeep Misra
Place of PublicationKorea
PublisherIFAC
Pages946-951
Volume1
EditionKorea
ISBN (Print)9783902661005
Publication statusPublished - 2008
EventTemperature Cycling for Photoresist Processing - Korea
Duration: 1 Jan 2008 → …

Conference

ConferenceTemperature Cycling for Photoresist Processing
Period1/01/08 → …

Cite this

Wang, Y., Chua, H., Tay, A., & Fang, Z. P. (2008). Temperature Cycling for Photoresist Processing. In M. J. Chung, & P. Misra (Eds.), Proceedings of the 17th World Congress (IFAC) (Korea ed., Vol. 1, pp. 946-951). Korea: IFAC.