Temperature Cycling for Photoresist Processing

Y. Wang, Hui Chua, A. Tay, Z.P. Fang

Research output: Chapter in Book/Conference paper › Conference paper

Original language	English
Title of host publication	Proceedings of the 17th World Congress (IFAC)
Editors	Myung Jin Chung, Pradeep Misra
Place of Publication	Korea
Publisher	IFAC
Pages	946-951
Volume	1
Edition	Korea
ISBN (Print)	9783902661005
Publication status	Published - 2008
Event	Temperature Cycling for Photoresist Processing - Korea Duration: 1 Jan 2008 → …

Conference	Temperature Cycling for Photoresist Processing
Period	1/01/08 → …

Cite this

@inproceedings{ea3c587ec1c94ecd84ef79f1beb2bda6,

title = "Temperature Cycling for Photoresist Processing",

author = "Y. Wang and Hui Chua and A. Tay and Z.P. Fang",

year = "2008",

language = "English",

isbn = "9783902661005",

volume = "1",

pages = "946--951",

editor = "Chung, {Myung Jin} and Pradeep Misra",

booktitle = "Proceedings of the 17th World Congress (IFAC)",

publisher = "IFAC",

edition = "Korea",

note = "Temperature Cycling for Photoresist Processing ; Conference date: 01-01-2008",

}

TY - GEN

T1 - Temperature Cycling for Photoresist Processing

AU - Wang, Y.

AU - Chua, Hui

AU - Tay, A.

AU - Fang, Z.P.

PY - 2008

Y1 - 2008

M3 - Conference paper

SN - 9783902661005

VL - 1

SP - 946

EP - 951

BT - Proceedings of the 17th World Congress (IFAC)

A2 - Chung, Myung Jin

A2 - Misra, Pradeep

PB - IFAC

CY - Korea

T2 - Temperature Cycling for Photoresist Processing

Y2 - 1 January 2008

ER -