Surface Morphology Control of Passivated Porous Silicon Using Reactive Ion Etching

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	756-761
Journal	IEEE Journal of Microelectromechanical Systems
Volume	21
Issue number	3
DOIs	https://doi.org/10.1109/JMEMS.2011.2182501
Publication status	Published - 2012

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@article{97d0a1f686604c83bf8ab64113255645,

title = "Surface Morphology Control of Passivated Porous Silicon Using Reactive Ion Etching",

author = "Meifang Lai and Giacinta Parish and Yinong Liu and Adrian Keating",

year = "2012",

doi = "10.1109/JMEMS.2011.2182501",

language = "English",

volume = "21",

pages = "756--761",

journal = "IEEE Journal of Microelectromechanical Systems",

issn = "1057-7157",

publisher = "IEEE, Institute of Electrical and Electronics Engineers",

number = "3",

}

TY - JOUR

T1 - Surface Morphology Control of Passivated Porous Silicon Using Reactive Ion Etching

AU - Lai, Meifang

AU - Parish, Giacinta

AU - Liu, Yinong

AU - Keating, Adrian

PY - 2012

Y1 - 2012

U2 - 10.1109/JMEMS.2011.2182501

DO - 10.1109/JMEMS.2011.2182501

M3 - Article

SN - 1057-7157

VL - 21

SP - 756

EP - 761

JO - IEEE Journal of Microelectromechanical Systems

JF - IEEE Journal of Microelectromechanical Systems

IS - 3

ER -