Study of interface formation of (Ba,Sr)TiO₃ thin films grown by rf sputter deposition on bare Si and thermal SiO₂/Si substrates

Engineering

• Si Substrate 100%
• Thin Films 100%
• Silicon Dioxide 100%
• Layer Thickness 50%
• Oxide Layer 50%
• Sio2 Film 50%
• Sio2 Layer 50%
• High Resolution 50%
• Interface Trap 50%
• Oxidized Si 50%

Material Science

• Sputter Deposition 100%
• Film 100%
• Thin Films 100%
• Capacitance 50%
• Electron Microscopy 50%
• Density 50%
• Oxidation Reaction 50%
• High-Resolution Transmission Electron Microscopy 50%
• Oxide Compound 50%