Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity

    Research output: Chapter in Book/Conference paperConference paper

    Original languageEnglish
    Title of host publicationThe 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014
    Place of PublicationSouth Korea
    PublisherTBC
    Pages1-2
    Volume1
    Publication statusPublished - 2014
    EventStandard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity - South Korea
    Duration: 1 Jan 2014 → …

    Conference

    ConferenceStandard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity
    Period1/01/14 → …

    Cite this

    Sun, X., Keating, A., & Parish, G. (2014). Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity. In The 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014 (Vol. 1, pp. 1-2). South Korea: TBC.
    Sun, Xiao ; Keating, Adrian ; Parish, Giacinta. / Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity. The 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014. Vol. 1 South Korea : TBC, 2014. pp. 1-2
    @inproceedings{f8869ca382384d9886aea209ab305cf4,
    title = "Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity",
    author = "Xiao Sun and Adrian Keating and Giacinta Parish",
    year = "2014",
    language = "English",
    volume = "1",
    pages = "1--2",
    booktitle = "The 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014",
    publisher = "TBC",

    }

    Sun, X, Keating, A & Parish, G 2014, Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity. in The 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014. vol. 1, TBC, South Korea, pp. 1-2, Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity, 1/01/14.

    Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity. / Sun, Xiao; Keating, Adrian; Parish, Giacinta.

    The 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014. Vol. 1 South Korea : TBC, 2014. p. 1-2.

    Research output: Chapter in Book/Conference paperConference paper

    TY - GEN

    T1 - Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity

    AU - Sun, Xiao

    AU - Keating, Adrian

    AU - Parish, Giacinta

    PY - 2014

    Y1 - 2014

    M3 - Conference paper

    VL - 1

    SP - 1

    EP - 2

    BT - The 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014

    PB - TBC

    CY - South Korea

    ER -

    Sun X, Keating A, Parish G. Standard photolithography compatible process released porous silicon microbeams with low stress, uniform porosity. In The 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies APCOT 2014. Vol. 1. South Korea: TBC. 2014. p. 1-2