Solution photochemistry of poly(dialkylsilanes): A new class of photoresists

J MICHL, JW DOWNING, T KARATSU, AJ MCKINLEY, G POGGI, GM WALLRAFF, R SOORIYAKUMARAN, RD MILLER

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@article{fd3ab9f74a9643228ad9ddb0625b04d6,

title = "Solution photochemistry of poly(dialkylsilanes): A new class of photoresists",

author = "J MICHL and JW DOWNING and T KARATSU and AJ MCKINLEY and G POGGI and GM WALLRAFF and R SOORIYAKUMARAN and RD MILLER",

year = "1988",

month = jul,

doi = "10.1351/pac198860070959",

language = "English",

volume = "60",

pages = "959--972",

journal = "Pure & Applied Chemistry",

issn = "0033-4545",

publisher = "Wiley-Blackwell",

number = "7",

}

TY - JOUR

T1 - Solution photochemistry of poly(dialkylsilanes)

T2 - A new class of photoresists

AU - MICHL, J

AU - DOWNING, JW

AU - KARATSU, T

AU - MCKINLEY, AJ

AU - POGGI, G

AU - WALLRAFF, GM

AU - SOORIYAKUMARAN, R

AU - MILLER, RD

PY - 1988/7

Y1 - 1988/7

U2 - 10.1351/pac198860070959

DO - 10.1351/pac198860070959

M3 - Article

SN - 0033-4545

VL - 60

SP - 959

EP - 972

JO - Pure & Applied Chemistry

JF - Pure & Applied Chemistry

IS - 7

ER -