SOLUTION PHOTOCHEMISTRY OF POLY(DIALKYLSILANES) - A NEW CLASS OF PHOTORESISTS

J MICHL, JW DOWNING, T KARATSU, AJ MCKINLEY, G POGGI, GM WALLRAFF, R SOORIYAKUMARAN, RD MILLER

Research output: Contribution to journalArticle

81 Citations (Scopus)
Original languageEnglish
Pages (from-to)959-972
Number of pages14
JournalPure and Applied Chemistry
Volume60
Issue number7
DOIs
Publication statusPublished - Jul 1988

Cite this

MICHL, J., DOWNING, JW., KARATSU, T., MCKINLEY, AJ., POGGI, G., WALLRAFF, GM., SOORIYAKUMARAN, R., & MILLER, RD. (1988). SOLUTION PHOTOCHEMISTRY OF POLY(DIALKYLSILANES) - A NEW CLASS OF PHOTORESISTS. Pure and Applied Chemistry, 60(7), 959-972. https://doi.org/10.1351/pac198860070959