Silicon and Silicon dioxide thin films deposited by ICPCVD at low temperature and high rate for MEMS applications

Praveen K. Revuri, D. K. Tripathi, M. Martyniuk, K. K.M.B.D. Silva, G. Putrino, Adrian Keating, L. Faraone

Research output: Chapter in Book/Conference paperConference paperpeer-review

4 Citations (Scopus)

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