SAW-based gas sensors with rf sputtered InOx and PECVD SiNx films: Response to H2 and O3 gases

A.C. Fechete; W. Wlodarski; K. Kalantar-Zadeh; A.S. Holland; Jarek Antoszewski; S. Kaciulis; L. Pandolfi

doi:10.1016/j.snb.2006.04.082

SAW-based gas sensors with rf sputtered InOx and PECVD SiNx films: Response to H2 and O3 gases

A.C. Fechete, W. Wlodarski, K. Kalantar-Zadeh, A.S. Holland, Jarek Antoszewski, S. Kaciulis, L. Pandolfi

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

Surface acoustic wave (SAW)-based sensors, with InOx and SiNx layers on 36 degrees YX LiTaO3 substrates were investigated for the detection of hydrogen (H-2) and ozone (O-3) gases at different operating temperatures. SiNx films with different thicknesses were deposited using the plasma enhanced chemical vapour deposition (PECVD) method. The InOx sensing layer was deposited using an rf magnetron sputterer. The sensors' performance was analyzed in terms of their frequency shifts as a function of different gas concentrations. The chemical-physical characterization of the deposited films was carried out by X-ray photoelectron spectroscopy (XPS). High sensitivities and excellent repeatabilities were observed towards both gases. (c) 2006 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	362-367
Journal	Sensors and Actuators B: Chemical
Volume	118
Issue number	1/2
DOIs	https://doi.org/10.1016/j.snb.2006.04.082
Publication status	Published - 2006

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10.1016/j.snb.2006.04.082

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title = "SAW-based gas sensors with rf sputtered InOx and PECVD SiNx films: Response to H2 and O3 gases",

abstract = "Surface acoustic wave (SAW)-based sensors, with InOx and SiNx layers on 36 degrees YX LiTaO3 substrates were investigated for the detection of hydrogen (H-2) and ozone (O-3) gases at different operating temperatures. SiNx films with different thicknesses were deposited using the plasma enhanced chemical vapour deposition (PECVD) method. The InOx sensing layer was deposited using an rf magnetron sputterer. The sensors' performance was analyzed in terms of their frequency shifts as a function of different gas concentrations. The chemical-physical characterization of the deposited films was carried out by X-ray photoelectron spectroscopy (XPS). High sensitivities and excellent repeatabilities were observed towards both gases. (c) 2006 Elsevier B.V. All rights reserved.",

author = "A.C. Fechete and W. Wlodarski and K. Kalantar-Zadeh and A.S. Holland and Jarek Antoszewski and S. Kaciulis and L. Pandolfi",

year = "2006",

doi = "10.1016/j.snb.2006.04.082",

language = "English",

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journal = "Sensors and Actuators B: Chemical",

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T1 - SAW-based gas sensors with rf sputtered InOx and PECVD SiNx films: Response to H2 and O3 gases

AU - Fechete, A.C.

AU - Wlodarski, W.

AU - Kalantar-Zadeh, K.

AU - Holland, A.S.

AU - Antoszewski, Jarek

AU - Kaciulis, S.

AU - Pandolfi, L.

PY - 2006

Y1 - 2006

N2 - Surface acoustic wave (SAW)-based sensors, with InOx and SiNx layers on 36 degrees YX LiTaO3 substrates were investigated for the detection of hydrogen (H-2) and ozone (O-3) gases at different operating temperatures. SiNx films with different thicknesses were deposited using the plasma enhanced chemical vapour deposition (PECVD) method. The InOx sensing layer was deposited using an rf magnetron sputterer. The sensors' performance was analyzed in terms of their frequency shifts as a function of different gas concentrations. The chemical-physical characterization of the deposited films was carried out by X-ray photoelectron spectroscopy (XPS). High sensitivities and excellent repeatabilities were observed towards both gases. (c) 2006 Elsevier B.V. All rights reserved.

AB - Surface acoustic wave (SAW)-based sensors, with InOx and SiNx layers on 36 degrees YX LiTaO3 substrates were investigated for the detection of hydrogen (H-2) and ozone (O-3) gases at different operating temperatures. SiNx films with different thicknesses were deposited using the plasma enhanced chemical vapour deposition (PECVD) method. The InOx sensing layer was deposited using an rf magnetron sputterer. The sensors' performance was analyzed in terms of their frequency shifts as a function of different gas concentrations. The chemical-physical characterization of the deposited films was carried out by X-ray photoelectron spectroscopy (XPS). High sensitivities and excellent repeatabilities were observed towards both gases. (c) 2006 Elsevier B.V. All rights reserved.

U2 - 10.1016/j.snb.2006.04.082

DO - 10.1016/j.snb.2006.04.082

M3 - Article

SN - 0925-4005

VL - 118

SP - 362

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JO - Sensors and Actuators B: Chemical

JF - Sensors and Actuators B: Chemical

IS - 1/2

ER -

SAW-based gas sensors with rf sputtered InOx and PECVD SiNx films: Response to H2 and O3 gases

Abstract

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