Released micromachined beams utilizing low stress, uniform porosity porous silicon

Research output: Contribution to conferenceAbstract

Abstract

Suspended micromachined porous silicon (PS) beams with low stress and uniform porosity are reported, based on standard CMOS compatible photolithography processes. Anodisation, RIE, repeated photolithography, lift off and electropolishing were used to release defined PS microbeams on a Si substrate. Excellent agreement with theoretical models allows both Young’s modulus and stress to be extracted from resonant measurements of the vibrating microbeams.
Original languageEnglish
Publication statusPublished - 2014
EventPorous Semiconductors - Science and Technology PSST 2014 - Hotel Melia, Benidorm, Spain
Duration: 9 Mar 201414 Mar 2014
http://the-psst.com/index.php?conference=PSST&schedConf=2014

Conference

ConferencePorous Semiconductors - Science and Technology PSST 2014
CountrySpain
CityBenidorm
Period9/03/1414/03/14
Internet address

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    Sun, X., Keating, A., & Parish, G. (2014). Released micromachined beams utilizing low stress, uniform porosity porous silicon. Abstract from Porous Semiconductors - Science and Technology PSST 2014, Benidorm, Spain.