Suspended micromachined porous silicon (PS) beams with low stress and uniform porosity are reported, based on standard CMOS compatible photolithography processes. Anodisation, RIE, repeated photolithography, lift off and electropolishing were used to release defined PS microbeams on a Si substrate. Excellent agreement with theoretical models allows both Young’s modulus and stress to be extracted from resonant measurements of the vibrating microbeams.
|Publication status||Published - 2014|
|Event||Porous Semiconductors - Science and Technology PSST 2014 - Hotel Melia, Benidorm, Spain|
Duration: 9 Mar 2014 → 14 Mar 2014
|Conference||Porous Semiconductors - Science and Technology PSST 2014|
|Period||9/03/14 → 14/03/14|
Sun, X., Keating, A., & Parish, G. (2014). Released micromachined beams utilizing low stress, uniform porosity porous silicon. Abstract from Porous Semiconductors - Science and Technology PSST 2014, Benidorm, Spain.