Released micromachined beams utilizing low stress, uniform porosity porous silicon

Xiao Sun; Adrian Keating; Giacinta Parish

Released micromachined beams utilizing low stress, uniform porosity porous silicon

Xiao Sun, Adrian Keating, Giacinta Parish

Research output: Contribution to conference › Abstract › peer-review

Abstract

Suspended micromachined porous silicon (PS) beams with low stress and uniform porosity are reported, based on standard CMOS compatible photolithography processes. Anodisation, RIE, repeated photolithography, lift off and electropolishing were used to release defined PS microbeams on a Si substrate. Excellent agreement with theoretical models allows both Young’s modulus and stress to be extracted from resonant measurements of the vibrating microbeams.

Original language	English
Publication status	Published - 2014
Event	Porous Semiconductors - Science and Technology PSST 2014 - Hotel Melia, Benidorm, Spain Duration: 9 Mar 2014 → 14 Mar 2014 http://the-psst.com/index.php?conference=PSST&schedConf=2014

Conference

Conference	Porous Semiconductors - Science and Technology PSST 2014
Country/Territory	Spain
City	Benidorm
Period	9/03/14 → 14/03/14
Internet address	http://the-psst.com/index.php?conference=PSST&schedConf=2014

Cite this

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title = "Released micromachined beams utilizing low stress, uniform porosity porous silicon",

abstract = "Suspended micromachined porous silicon (PS) beams with low stress and uniform porosity are reported, based on standard CMOS compatible photolithography processes. Anodisation, RIE, repeated photolithography, lift off and electropolishing were used to release defined PS microbeams on a Si substrate. Excellent agreement with theoretical models allows both Young{\textquoteright}s modulus and stress to be extracted from resonant measurements of the vibrating microbeams. ",

author = "Xiao Sun and Adrian Keating and Giacinta Parish",

year = "2014",

language = "English",

note = "Porous Semiconductors - Science and Technology PSST 2014 ; Conference date: 09-03-2014 Through 14-03-2014",

url = "http://the-psst.com/index.php?conference=PSST&schedConf=2014",

}

TY - CONF

T1 - Released micromachined beams utilizing low stress, uniform porosity porous silicon

AU - Sun, Xiao

AU - Keating, Adrian

AU - Parish, Giacinta

PY - 2014

Y1 - 2014

N2 - Suspended micromachined porous silicon (PS) beams with low stress and uniform porosity are reported, based on standard CMOS compatible photolithography processes. Anodisation, RIE, repeated photolithography, lift off and electropolishing were used to release defined PS microbeams on a Si substrate. Excellent agreement with theoretical models allows both Young’s modulus and stress to be extracted from resonant measurements of the vibrating microbeams.

AB - Suspended micromachined porous silicon (PS) beams with low stress and uniform porosity are reported, based on standard CMOS compatible photolithography processes. Anodisation, RIE, repeated photolithography, lift off and electropolishing were used to release defined PS microbeams on a Si substrate. Excellent agreement with theoretical models allows both Young’s modulus and stress to be extracted from resonant measurements of the vibrating microbeams.

UR - http://the-psst.com/index.php?conference=PSST&schedConf=2014&page=paper&op=view&path%5B%5D=149

UR - http://the-psst.com/index.php?conference=PSST&schedConf=2014&page=schedConf&op=presentations

M3 - Abstract

T2 - Porous Semiconductors - Science and Technology PSST 2014

Y2 - 9 March 2014 through 14 March 2014

ER -

Released micromachined beams utilizing low stress, uniform porosity porous silicon

Abstract

Conference

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