TY - JOUR
T1 - Released micromachined beams utilizing laterally uniform porosity porous silicon
AU - Sun, Xiao
AU - Keating, Adrian
AU - Parish, Giacinta
PY - 2014/8/22
Y1 - 2014/8/22
N2 - © 2014, Sun et al.; licensee Springer. Abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces. PACS: 81.16.-c; 81.16.Nd; 81.16.Rf
AB - © 2014, Sun et al.; licensee Springer. Abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces. PACS: 81.16.-c; 81.16.Nd; 81.16.Rf
U2 - 10.1186/1556-276X-9-426
DO - 10.1186/1556-276X-9-426
M3 - Article
SN - 1931-7573
VL - 9
JO - Nanoscale Research Letters
JF - Nanoscale Research Letters
ER -