Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes

Research output: Chapter in Book/Conference paper › Conference paper

Original language	English
Title of host publication	The 5th Asia-Pacific Conference on Transducers and Micro-Nano Technology (APCOT)
Editors	John Dell, Wojtek Wlodarski, Adrian Keating, Mariusz Martyniuk
Place of Publication	Perth, Western Australia
Publisher	UWA
Pages	N/A
Volume	39
Edition	UWA, Perth
ISBN (Print)	9781740522076
Publication status	Published - 2010
Event	Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes - Duration: 1 Jan 2010 → …

Conference	Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes
Period	1/01/10 → …

Cite this

Lai, Meifang ; Parish, Giacinta ; Dell, John et al. / Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes. The 5th Asia-Pacific Conference on Transducers and Micro-Nano Technology (APCOT). editor / John Dell ; Wojtek Wlodarski ; Adrian Keating ; Mariusz Martyniuk. Vol. 39 UWA, Perth. ed. Perth, Western Australia : UWA, 2010. pp. N/A

@inproceedings{ce1415dbac3741018680fa072838c5c3,

title = "Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes",

author = "Meifang Lai and Giacinta Parish and John Dell and Yinong Liu and Adrian Keating",

year = "2010",

language = "English",

isbn = "9781740522076",

volume = "39",

pages = "N/A",

editor = "John Dell and Wojtek Wlodarski and Adrian Keating and Mariusz Martyniuk",

booktitle = "The 5th Asia-Pacific Conference on Transducers and Micro-Nano Technology (APCOT)",

publisher = "UWA",

edition = "UWA, Perth",

note = "Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes ; Conference date: 01-01-2010",

}

Lai, M, Parish, G , Dell, J , Liu, Y & Keating, A 2010, Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes. in J Dell, W Wlodarski, A Keating & M Martyniuk (eds), The 5th Asia-Pacific Conference on Transducers and Micro-Nano Technology (APCOT). UWA, Perth edn, vol. 39, UWA, Perth, Western Australia, pp. N/A, Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes, 1/01/10.

Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes. / Lai, Meifang; Parish, Giacinta ; Dell, John et al.
The 5th Asia-Pacific Conference on Transducers and Micro-Nano Technology (APCOT). ed. / John Dell; Wojtek Wlodarski; Adrian Keating; Mariusz Martyniuk. Vol. 39 UWA, Perth. ed. Perth, Western Australia: UWA, 2010. p. N/A.

Research output: Chapter in Book/Conference paper › Conference paper

TY - GEN

T1 - Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes

AU - Lai, Meifang

AU - Parish, Giacinta

AU - Dell, John

AU - Liu, Yinong

AU - Keating, Adrian

PY - 2010

Y1 - 2010

M3 - Conference paper

SN - 9781740522076

VL - 39

SP - N/A

BT - The 5th Asia-Pacific Conference on Transducers and Micro-Nano Technology (APCOT)

A2 - Dell, John

A2 - Wlodarski, Wojtek

A2 - Keating, Adrian

A2 - Martyniuk, Mariusz

PB - UWA

CY - Perth, Western Australia

T2 - Reactive Ion Etching (RIE) of porous silicon patterned directly using photolithographic processes

Y2 - 1 January 2010

ER -