Reactive ion etching for mesa structuring in HgCdTe

E.P.G. Smith, Charles Musca, D.A. Redfern, John Dell, Lorenzo Faraone

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	2503-2509
Journal	Journal of Vacuum Science and Technology A
Volume	17
Issue number	5
Publication status	Published - 1999

Cite this

@article{575ec83625b3401fa1769637b3be4e52,

title = "Reactive ion etching for mesa structuring in HgCdTe",

author = "E.P.G. Smith and Charles Musca and D.A. Redfern and John Dell and Lorenzo Faraone",

year = "1999",

language = "English",

volume = "17",

pages = "2503--2509",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "5",

}