Polysilanes - Photochemistry and Deep UV Lithography

RD MILLER, G WALLRAFF, N CLECAK, R SOORIYAKUMARAN, J MICHL, T KARATSU, AJ MCKINLEY, KA KLINGENSMITH, J DOWNING

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	882-886
Number of pages	5
Journal	Polymer Engineering and Science
Volume	29
Issue number	13
DOIs	https://doi.org/10.1002/pen.760291311
Publication status	Published - Jul 1989
Externally published	Yes

Access to Document

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title = "Polysilanes - Photochemistry and Deep UV Lithography",

author = "RD MILLER and G WALLRAFF and N CLECAK and R SOORIYAKUMARAN and J MICHL and T KARATSU and AJ MCKINLEY and KA KLINGENSMITH and J DOWNING",

year = "1989",

month = jul,

doi = "10.1002/pen.760291311",

language = "English",

volume = "29",

pages = "882--886",

journal = "Polymer Engineering and Science",

issn = "0032-3888",

publisher = "SOC PLASTICS ENG INC",

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TY - JOUR

T1 - Polysilanes - Photochemistry and Deep UV Lithography

AU - MILLER, RD

AU - WALLRAFF, G

AU - CLECAK, N

AU - SOORIYAKUMARAN, R

AU - MICHL, J

AU - KARATSU, T

AU - MCKINLEY, AJ

AU - KLINGENSMITH, KA

AU - DOWNING, J

PY - 1989/7

Y1 - 1989/7

U2 - 10.1002/pen.760291311

DO - 10.1002/pen.760291311

M3 - Article

VL - 29

SP - 882

EP - 886

JO - Polymer Engineering and Science

JF - Polymer Engineering and Science

SN - 0032-3888

IS - 13

ER -