Optimization of ICPCVD Amorphous Silicon for Optical MEMS Applications

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Abstract

© 1992-2012 IEEE. In this paper, we present the optimization of optical and mechanical properties of inductively coupled plasma chemical vapor deposited (ICPCVD) amorphous silicon thin films for fabrication of high-quality optical microelectromechanical systems-based devices operating from visible to short-wave infrared wavelengths (450-3000 nm). Our results indicate that, at relatively high deposition temperatures for plasma CVD, a decrease in the ICP power results in films with lower tensile stress, higher refractive index, and lower extinction coefficient. We show that hydrogen concentration alone is not a sufficient parameter for controlling optical and mechanical quality of the films. In particular, both the hydrogen concentration and the hydrogen-silicon bonding nature together play a vital role in determining the optical and the mechanical quality of the silicon thin films. As a demonstration vehicle, three layer silicon-silicon oxide-silicon-based distributed Bragg reflectors were fabricated for the visible (500-700 nm), near infrared (700-1000 nm), and short-wave infrared (2000-3000 nm) wavelength ranges using an optimized silicon fabrication recipe. The measured optical transmission spectra show close to 90% peak reflectivity. Finally, stress optimization was evaluated by fabricating 270-μm diameter circular suspended silicon membranes, which demonstrate a flatness variation on the order of
Original languageEnglish
Pages (from-to)1998-2007
JournalJournal of Microelectromechanical Systems
Volume24
Issue number6
DOIs
Publication statusPublished - 2015

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MOEMS
Inductively coupled plasma
Amorphous silicon
Vapors
Silicon
Infrared radiation
Hydrogen
Plasma CVD
Distributed Bragg reflectors
Fabrication
Thin films
Wavelength
Silicon oxides
Light transmission
Tensile stress
MEMS
Refractive index
Demonstrations
Optical properties
Membranes

Cite this

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title = "Optimization of ICPCVD Amorphous Silicon for Optical MEMS Applications",
abstract = "{\circledC} 1992-2012 IEEE. In this paper, we present the optimization of optical and mechanical properties of inductively coupled plasma chemical vapor deposited (ICPCVD) amorphous silicon thin films for fabrication of high-quality optical microelectromechanical systems-based devices operating from visible to short-wave infrared wavelengths (450-3000 nm). Our results indicate that, at relatively high deposition temperatures for plasma CVD, a decrease in the ICP power results in films with lower tensile stress, higher refractive index, and lower extinction coefficient. We show that hydrogen concentration alone is not a sufficient parameter for controlling optical and mechanical quality of the films. In particular, both the hydrogen concentration and the hydrogen-silicon bonding nature together play a vital role in determining the optical and the mechanical quality of the silicon thin films. As a demonstration vehicle, three layer silicon-silicon oxide-silicon-based distributed Bragg reflectors were fabricated for the visible (500-700 nm), near infrared (700-1000 nm), and short-wave infrared (2000-3000 nm) wavelength ranges using an optimized silicon fabrication recipe. The measured optical transmission spectra show close to 90{\%} peak reflectivity. Finally, stress optimization was evaluated by fabricating 270-μm diameter circular suspended silicon membranes, which demonstrate a flatness variation on the order of",
author = "Dhirendra Tripathi and F. Jiang and Mariusz Martyniuk and Jarek Antoszewski and Dilusha Silva and John Dell and Lorenzo Faraone",
year = "2015",
doi = "10.1109/JMEMS.2015.2459066",
language = "English",
volume = "24",
pages = "1998--2007",
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issn = "1057-7157",
publisher = "IEEE, Institute of Electrical and Electronics Engineers",
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TY - JOUR

T1 - Optimization of ICPCVD Amorphous Silicon for Optical MEMS Applications

AU - Tripathi, Dhirendra

AU - Jiang, F.

AU - Martyniuk, Mariusz

AU - Antoszewski, Jarek

AU - Silva, Dilusha

AU - Dell, John

AU - Faraone, Lorenzo

PY - 2015

Y1 - 2015

N2 - © 1992-2012 IEEE. In this paper, we present the optimization of optical and mechanical properties of inductively coupled plasma chemical vapor deposited (ICPCVD) amorphous silicon thin films for fabrication of high-quality optical microelectromechanical systems-based devices operating from visible to short-wave infrared wavelengths (450-3000 nm). Our results indicate that, at relatively high deposition temperatures for plasma CVD, a decrease in the ICP power results in films with lower tensile stress, higher refractive index, and lower extinction coefficient. We show that hydrogen concentration alone is not a sufficient parameter for controlling optical and mechanical quality of the films. In particular, both the hydrogen concentration and the hydrogen-silicon bonding nature together play a vital role in determining the optical and the mechanical quality of the silicon thin films. As a demonstration vehicle, three layer silicon-silicon oxide-silicon-based distributed Bragg reflectors were fabricated for the visible (500-700 nm), near infrared (700-1000 nm), and short-wave infrared (2000-3000 nm) wavelength ranges using an optimized silicon fabrication recipe. The measured optical transmission spectra show close to 90% peak reflectivity. Finally, stress optimization was evaluated by fabricating 270-μm diameter circular suspended silicon membranes, which demonstrate a flatness variation on the order of

AB - © 1992-2012 IEEE. In this paper, we present the optimization of optical and mechanical properties of inductively coupled plasma chemical vapor deposited (ICPCVD) amorphous silicon thin films for fabrication of high-quality optical microelectromechanical systems-based devices operating from visible to short-wave infrared wavelengths (450-3000 nm). Our results indicate that, at relatively high deposition temperatures for plasma CVD, a decrease in the ICP power results in films with lower tensile stress, higher refractive index, and lower extinction coefficient. We show that hydrogen concentration alone is not a sufficient parameter for controlling optical and mechanical quality of the films. In particular, both the hydrogen concentration and the hydrogen-silicon bonding nature together play a vital role in determining the optical and the mechanical quality of the silicon thin films. As a demonstration vehicle, three layer silicon-silicon oxide-silicon-based distributed Bragg reflectors were fabricated for the visible (500-700 nm), near infrared (700-1000 nm), and short-wave infrared (2000-3000 nm) wavelength ranges using an optimized silicon fabrication recipe. The measured optical transmission spectra show close to 90% peak reflectivity. Finally, stress optimization was evaluated by fabricating 270-μm diameter circular suspended silicon membranes, which demonstrate a flatness variation on the order of

U2 - 10.1109/JMEMS.2015.2459066

DO - 10.1109/JMEMS.2015.2459066

M3 - Article

VL - 24

SP - 1998

EP - 2007

JO - Journal of Microelectromechanical Systems

JF - Journal of Microelectromechanical Systems

SN - 1057-7157

IS - 6

ER -