Nanoindentation of Si<inf>1−x</inf>Ge<inf>x</inf> thin films prepared by biased target ion beam deposition

Ruijing Ge; Xiaowei Hou; Kirsten Brookshire; N. Radha Krishnan; Dilusha Silva; John Bumgarner; Yinong Liu; Lorenzo Faraone; Mariusz Martyniuk

doi:10.1109/commad.2014.7038692

Nanoindentation of Si<inf>1−x</inf>Ge<inf>x</inf> thin films prepared by biased target ion beam deposition

Ruijing Ge, Xiaowei Hou, Kirsten Brookshire, N. Radha Krishnan, Dilusha Silva, John Bumgarner, Yinong Liu, Lorenzo Faraone, Mariusz Martyniuk

Research output: Chapter in Book/Conference paper › Conference paper › peer-review

Original language	English
Title of host publication	2014 Conference on Optoelectronic and Microelectronic Materials & Devices
DOIs	https://doi.org/10.1109/commad.2014.7038692
Publication status	Published - 2014

Access to Document

10.1109/commad.2014.7038692

Cite this

@inproceedings{7b6057e021d94c6ca344848a3f391323,

title = "Nanoindentation of Si1−xGex thin films prepared by biased target ion beam deposition",

author = "Ruijing Ge and Xiaowei Hou and Kirsten Brookshire and Krishnan, {N. Radha} and Dilusha Silva and John Bumgarner and Yinong Liu and Lorenzo Faraone and Mariusz Martyniuk",

year = "2014",

doi = "10.1109/commad.2014.7038692",

language = "English",

isbn = "9781479968688",

booktitle = "2014 Conference on Optoelectronic and Microelectronic Materials & Devices",

}

TY - GEN

T1 - Nanoindentation of Si1−xGex thin films prepared by biased target ion beam deposition

AU - Ge, Ruijing

AU - Hou, Xiaowei

AU - Brookshire, Kirsten

AU - Krishnan, N. Radha

AU - Silva, Dilusha

AU - Bumgarner, John

AU - Liu, Yinong

AU - Faraone, Lorenzo

AU - Martyniuk, Mariusz

PY - 2014

Y1 - 2014

U2 - 10.1109/commad.2014.7038692

DO - 10.1109/commad.2014.7038692

M3 - Conference paper

SN - 9781479968688

BT - 2014 Conference on Optoelectronic and Microelectronic Materials & Devices

ER -