Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition

R Ge; X Hou; Kirsten Brookshire; N.R. Krishnan; Dilusha Silva; John Bumgarner; Yinong Liu; Lorenzo Faraone; Mariusz Martyniuk

Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition

R Ge, X Hou, Kirsten Brookshire, N.R. Krishnan, Dilusha Silva, John Bumgarner, Yinong Liu, Lorenzo Faraone, Mariusz Martyniuk

Research output: Chapter in Book/Conference paper › Conference paper › peer-review

4 Citations (Scopus)

Original language	English
Title of host publication	Conference on Optoelectronic and Microelectronic Materials and Devices
Editors	Lorenzo Faraone, Mariusz Martyniuk
Place of Publication	USA
Publisher	IEEE, Institute of Electrical and Electronics Engineers
Pages	210-213
Volume	1
ISBN (Print)	9781479968688
Publication status	Published - 2014
Event	2014 Conference on Optoelectronic and Microelectronic Materials and Devices - University of Western Australia, Perth, Australia Duration: 14 Dec 2014 → 17 Dec 2014

Publication series

Name	Conference on Optoelectronic and Microelectronic Materials and Devices
Publisher	IEEE
ISSN (Print)	1097-2137

Conference

Conference	2014 Conference on Optoelectronic and Microelectronic Materials and Devices
Abbreviated title	COMMAD 2014
Country/Territory	Australia
City	Perth
Period	14/12/14 → 17/12/14

Cite this

Ge, R., Hou, X., Brookshire, K., Krishnan, N. R., Silva, D., Bumgarner, J., Liu, Y., Faraone, L., & Martyniuk, M. (2014). Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition. In L. Faraone, & M. Martyniuk (Eds.), Conference on Optoelectronic and Microelectronic Materials and Devices (Vol. 1, pp. 210-213). (Conference on Optoelectronic and Microelectronic Materials and Devices). IEEE, Institute of Electrical and Electronics Engineers.

Ge, R ; Hou, X ; Brookshire, Kirsten et al. / Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition. Conference on Optoelectronic and Microelectronic Materials and Devices. editor / Lorenzo Faraone ; Mariusz Martyniuk. Vol. 1 USA : IEEE, Institute of Electrical and Electronics Engineers, 2014. pp. 210-213 (Conference on Optoelectronic and Microelectronic Materials and Devices).

@inproceedings{ddee95de7d404802b0d0265077bbae10,

title = "Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition",

author = "R Ge and X Hou and Kirsten Brookshire and N.R. Krishnan and Dilusha Silva and John Bumgarner and Yinong Liu and Lorenzo Faraone and Mariusz Martyniuk",

year = "2014",

language = "English",

isbn = "9781479968688",

volume = "1",

series = "Conference on Optoelectronic and Microelectronic Materials and Devices",

publisher = "IEEE, Institute of Electrical and Electronics Engineers",

pages = "210--213",

editor = "Lorenzo Faraone and Mariusz Martyniuk",

booktitle = "Conference on Optoelectronic and Microelectronic Materials and Devices",

address = "United States",

note = "2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014 ; Conference date: 14-12-2014 Through 17-12-2014",

}

Ge, R, Hou, X, Brookshire, K, Krishnan, NR, Silva, D, Bumgarner, J, Liu, Y , Faraone, L & Martyniuk, M 2014, Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition. in L Faraone & M Martyniuk (eds), Conference on Optoelectronic and Microelectronic Materials and Devices. vol. 1, Conference on Optoelectronic and Microelectronic Materials and Devices, IEEE, Institute of Electrical and Electronics Engineers, USA, pp. 210-213, 2014 Conference on Optoelectronic and Microelectronic Materials and Devices, Perth, Australia, 14/12/14.

Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition. / Ge, R; Hou, X; Brookshire, Kirsten et al.
Conference on Optoelectronic and Microelectronic Materials and Devices. ed. / Lorenzo Faraone; Mariusz Martyniuk. Vol. 1 USA: IEEE, Institute of Electrical and Electronics Engineers, 2014. p. 210-213 (Conference on Optoelectronic and Microelectronic Materials and Devices).

Research output: Chapter in Book/Conference paper › Conference paper › peer-review

TY - GEN

T1 - Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition

AU - Ge, R

AU - Hou, X

AU - Brookshire, Kirsten

AU - Krishnan, N.R.

AU - Silva, Dilusha

AU - Bumgarner, John

AU - Liu, Yinong

AU - Faraone, Lorenzo

AU - Martyniuk, Mariusz

PY - 2014

Y1 - 2014

M3 - Conference paper

SN - 9781479968688

VL - 1

T3 - Conference on Optoelectronic and Microelectronic Materials and Devices

SP - 210

EP - 213

BT - Conference on Optoelectronic and Microelectronic Materials and Devices

A2 - Faraone, Lorenzo

A2 - Martyniuk, Mariusz

PB - IEEE, Institute of Electrical and Electronics Engineers

CY - USA

T2 - 2014 Conference on Optoelectronic and Microelectronic Materials and Devices

Y2 - 14 December 2014 through 17 December 2014

ER -

Ge R, Hou X, Brookshire K, Krishnan NR, Silva D, Bumgarner J et al. Nanoindentation of Si1-xGex thin films prepared by biased target ion beam deposition. In Faraone L, Martyniuk M, editors, Conference on Optoelectronic and Microelectronic Materials and Devices. Vol. 1. USA: IEEE, Institute of Electrical and Electronics Engineers. 2014. p. 210-213. (Conference on Optoelectronic and Microelectronic Materials and Devices).