Modeling and real-time control of multi-zone thermal processing system for photoresist processing

A. Tay, Hui Chua, Y. Wang, G. Yang, W. K. Ho

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Original language	English
Pages (from-to)	4805-4814
Journal	Industrial & Engineering Chemistry Research
Volume	15
Issue number	13
DOIs	https://doi.org/10.1021/ie3017434
Publication status	Published - 2013

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title = "Modeling and real-time control of multi-zone thermal processing system for photoresist processing",

author = "A. Tay and Hui Chua and Y. Wang and G. Yang and Ho, {W. K.}",

year = "2013",

doi = "10.1021/ie3017434",

language = "English",

volume = "15",

pages = "4805--4814",

journal = "Industrial & Engineering Chemistry Research",

issn = "0888-5885",

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TY - JOUR

T1 - Modeling and real-time control of multi-zone thermal processing system for photoresist processing

AU - Tay, A.

AU - Chua, Hui

AU - Wang, Y.

AU - Yang, G.

AU - Ho, W. K.

PY - 2013

Y1 - 2013

U2 - 10.1021/ie3017434

DO - 10.1021/ie3017434

M3 - Article

SN - 0888-5885

VL - 15

SP - 4805

EP - 4814

JO - Industrial & Engineering Chemistry Research

JF - Industrial & Engineering Chemistry Research

IS - 13

ER -