Metal-doped carbon films obtained by magnetron sputtering

Martin Balden; B. T. Cieciwa; I. Quintana; E. de Juan Pardo; F. Koch; M. Sikora; B. Dubiel

doi:10.1016/j.surfcoat.2005.02.218

Metal-doped carbon films obtained by magnetron sputtering

Martin Balden, B. T. Cieciwa, I. Quintana, E. de Juan Pardo, F. Koch, M. Sikora, B. Dubiel

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

Carbon films doped with Ti, V, W, Zr, Cr, and Cu were produced by magnetron sputtering. To predict the film composition, the deposition rates were systematically studied as a function of discharge power and working pressure. The achieved dopant concentrations range from 20 down to 1 at.%. The films are laterally homogeneously doped and show columnar growth. The dopant distribution is not thermally stable. After heating at 1100 K, the carbides TiC, VC, WC, ZrC, and Cr₃C₂ are definitely present and their grain size is on the nanometre scale. Cu segregates out. There are strong indications of the formation of carbides already during deposition.

Original language	English
Pages (from-to)	413-417
Number of pages	5
Journal	Surface and Coatings Technology
Volume	200
Issue number	1-4 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.surfcoat.2005.02.218
Publication status	Published - 1 Oct 2005
Externally published	Yes

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10.1016/j.surfcoat.2005.02.218

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title = "Metal-doped carbon films obtained by magnetron sputtering",

abstract = "Carbon films doped with Ti, V, W, Zr, Cr, and Cu were produced by magnetron sputtering. To predict the film composition, the deposition rates were systematically studied as a function of discharge power and working pressure. The achieved dopant concentrations range from 20 down to 1 at.%. The films are laterally homogeneously doped and show columnar growth. The dopant distribution is not thermally stable. After heating at 1100 K, the carbides TiC, VC, WC, ZrC, and Cr3C2 are definitely present and their grain size is on the nanometre scale. Cu segregates out. There are strong indications of the formation of carbides already during deposition.",

keywords = "Ceramics, carbides, Diffraction, XRD, Non-metals carbon, Spectroscopy, RBS, Structure, crystalline, Structures, nanostructures",

author = "Martin Balden and Cieciwa, {B. T.} and I. Quintana and {de Juan Pardo}, E. and F. Koch and M. Sikora and B. Dubiel",

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language = "English",

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TY - JOUR

T1 - Metal-doped carbon films obtained by magnetron sputtering

AU - Balden, Martin

AU - Cieciwa, B. T.

AU - Quintana, I.

AU - de Juan Pardo, E.

AU - Koch, F.

AU - Sikora, M.

AU - Dubiel, B.

PY - 2005/10/1

Y1 - 2005/10/1

N2 - Carbon films doped with Ti, V, W, Zr, Cr, and Cu were produced by magnetron sputtering. To predict the film composition, the deposition rates were systematically studied as a function of discharge power and working pressure. The achieved dopant concentrations range from 20 down to 1 at.%. The films are laterally homogeneously doped and show columnar growth. The dopant distribution is not thermally stable. After heating at 1100 K, the carbides TiC, VC, WC, ZrC, and Cr3C2 are definitely present and their grain size is on the nanometre scale. Cu segregates out. There are strong indications of the formation of carbides already during deposition.

AB - Carbon films doped with Ti, V, W, Zr, Cr, and Cu were produced by magnetron sputtering. To predict the film composition, the deposition rates were systematically studied as a function of discharge power and working pressure. The achieved dopant concentrations range from 20 down to 1 at.%. The films are laterally homogeneously doped and show columnar growth. The dopant distribution is not thermally stable. After heating at 1100 K, the carbides TiC, VC, WC, ZrC, and Cr3C2 are definitely present and their grain size is on the nanometre scale. Cu segregates out. There are strong indications of the formation of carbides already during deposition.

KW - Ceramics, carbides

KW - Diffraction, XRD

KW - Non-metals carbon

KW - Spectroscopy, RBS

KW - Structure, crystalline

KW - Structures, nanostructures

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U2 - 10.1016/j.surfcoat.2005.02.218

DO - 10.1016/j.surfcoat.2005.02.218

M3 - Article

AN - SCOPUS:24644512834

SN - 0257-8972

VL - 200

SP - 413

EP - 417

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 1-4 SPEC. ISS.

ER -

Metal-doped carbon films obtained by magnetron sputtering

Abstract

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