The materials and processes for fabrication of monolithicallyintegrated microelectromechanical systems-based microspectrometersoperating in the short-wavelength IR range ispresented. Using low-temperature surface micromachining techniques,compatible with a range of IR sensor technologies, siliconnitride-based tunable Fabry–Perot filter structures with distributedBragg mirrorsmade ofGe/SiO/Ge layers have been monolithicallyintegrated with HgCdTe photoconductors. The stresswithin and between themany layers of the structure has been eliminatedor compensated by stress tuning of the deposition conditions.The demonstrated microspectrometers have a tuning range of 1.8–2.2 μm with relative peak transmission of 70% and full-width athalf-maximum of 80 ± 10 nm.
|Journal||IEEE Journal of Selected Topics in Quantum Electronics|
|Publication status||Published - 2008|