Abstract
InAs/GaAsBi dot-in-well structures were fabricated using gas-source
molecular beam epitaxy and investigated for its optical and structural
properties. GaAsBi-strained buffer layer and strain reduction layer are
both effective to extend the photoluminescence (PL) emission wavelength
of InAs quantum dot (QD). In addition, a remarkable PL intensity
enhancement is also obtained compared with low-temperature-grown
GaAs-capped InAs QD sample. The GaAsBi matrix also preserves the shape
of InAs QDs and leads to increase the activation energy for nonradiative
recombination process at low temperature. Lower density and larger size
of InAs QDs are obtained on the GaAsBi surface compared with the QDs
grown on GaAs surface.
Original language | English |
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Article number | 280 |
Pages (from-to) | 280 |
Journal | Nanoscale Research Letters |
Volume | 11 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1 Dec 2016 |
Externally published | Yes |