In-situ Real-time Temperature Control of Baking Systems in Lithography

Y. Wang, Hui Chua, A. Tay

Research output: Chapter in Book/Conference paperConference paperpeer-review

Original languageEnglish
Title of host publicationProceedings of SPIE Metrology, Inspection, and Process Control for Microlithography XXII
EditorsJ.A. Allgair, C.J. Raymond
Place of PublicationUSA
PublisherSPIE
Pages692237-1 to 62237-8
Volume6922
EditionCalifornia, USA
ISBN (Print)9780819471079
Publication statusPublished - 2008
EventMetrology, Inspection, and Process Control for Microlithography XXII
- San Jose, United States
Duration: 25 Feb 200828 Feb 2008

Conference

ConferenceMetrology, Inspection, and Process Control for Microlithography XXII
Country/TerritoryUnited States
CitySan Jose
Period25/02/0828/02/08

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