Imaging of surface strain and polishing artefacts in fused silica by environmental scanning electron microscopy

S.P. Galvin, Brendan Griffin, J. Browne

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The recently developed application of charge contrast imaging (CCI), available in variable pressure or environmental scanning electron microscopes (ESEM), has been found to provide images of near surface strain around micro-indentations in fused silica glass. Results suggest this strain contrast information is derived from within a few nanometres of the material surface, making CCI an invaluable tool for the study of nanometre scale surface deformation. Images of indentation strain have also been imaged using backscattered electron (BSE) imaging. The CCI technique has also been applied to the study of fused silica surfaces polished by chemically active polishing abrasives. In the samples studied, CCI provides unique images of linear defects residing below layers of chemically adhered polishing compound. Visualisation of surface strain on sub-nm rms glasses provides supporting evidence for plastic (permanent) deformation of the glass surface at the nanometre level during polishing with certain abrasives and for chemical interactions between the polishing abrasive and glass surface. (C) 2001 Kluwer Academic Publishers.
Original languageEnglish
Pages (from-to)5683-5696
JournalJournal of Materials Science
Volume36
Issue number23
DOIs
Publication statusPublished - 2001

Fingerprint

Fused silica
Polishing
Imaging techniques
Scanning electron microscopy
Abrasives
Indentation
Glass
Electron microscopes
Visualization
Plastics
Scanning
Defects
Electrons

Cite this

Galvin, S.P. ; Griffin, Brendan ; Browne, J. / Imaging of surface strain and polishing artefacts in fused silica by environmental scanning electron microscopy. In: Journal of Materials Science. 2001 ; Vol. 36, No. 23. pp. 5683-5696.
@article{6c122d2b6d654ee9bfedf199b6e5d1ee,
title = "Imaging of surface strain and polishing artefacts in fused silica by environmental scanning electron microscopy",
abstract = "The recently developed application of charge contrast imaging (CCI), available in variable pressure or environmental scanning electron microscopes (ESEM), has been found to provide images of near surface strain around micro-indentations in fused silica glass. Results suggest this strain contrast information is derived from within a few nanometres of the material surface, making CCI an invaluable tool for the study of nanometre scale surface deformation. Images of indentation strain have also been imaged using backscattered electron (BSE) imaging. The CCI technique has also been applied to the study of fused silica surfaces polished by chemically active polishing abrasives. In the samples studied, CCI provides unique images of linear defects residing below layers of chemically adhered polishing compound. Visualisation of surface strain on sub-nm rms glasses provides supporting evidence for plastic (permanent) deformation of the glass surface at the nanometre level during polishing with certain abrasives and for chemical interactions between the polishing abrasive and glass surface. (C) 2001 Kluwer Academic Publishers.",
author = "S.P. Galvin and Brendan Griffin and J. Browne",
year = "2001",
doi = "10.1023/A:1012586204236",
language = "English",
volume = "36",
pages = "5683--5696",
journal = "Journal of Materials Science",
issn = "0022-2461",
publisher = "Springer",
number = "23",

}

Imaging of surface strain and polishing artefacts in fused silica by environmental scanning electron microscopy. / Galvin, S.P.; Griffin, Brendan; Browne, J.

In: Journal of Materials Science, Vol. 36, No. 23, 2001, p. 5683-5696.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Imaging of surface strain and polishing artefacts in fused silica by environmental scanning electron microscopy

AU - Galvin, S.P.

AU - Griffin, Brendan

AU - Browne, J.

PY - 2001

Y1 - 2001

N2 - The recently developed application of charge contrast imaging (CCI), available in variable pressure or environmental scanning electron microscopes (ESEM), has been found to provide images of near surface strain around micro-indentations in fused silica glass. Results suggest this strain contrast information is derived from within a few nanometres of the material surface, making CCI an invaluable tool for the study of nanometre scale surface deformation. Images of indentation strain have also been imaged using backscattered electron (BSE) imaging. The CCI technique has also been applied to the study of fused silica surfaces polished by chemically active polishing abrasives. In the samples studied, CCI provides unique images of linear defects residing below layers of chemically adhered polishing compound. Visualisation of surface strain on sub-nm rms glasses provides supporting evidence for plastic (permanent) deformation of the glass surface at the nanometre level during polishing with certain abrasives and for chemical interactions between the polishing abrasive and glass surface. (C) 2001 Kluwer Academic Publishers.

AB - The recently developed application of charge contrast imaging (CCI), available in variable pressure or environmental scanning electron microscopes (ESEM), has been found to provide images of near surface strain around micro-indentations in fused silica glass. Results suggest this strain contrast information is derived from within a few nanometres of the material surface, making CCI an invaluable tool for the study of nanometre scale surface deformation. Images of indentation strain have also been imaged using backscattered electron (BSE) imaging. The CCI technique has also been applied to the study of fused silica surfaces polished by chemically active polishing abrasives. In the samples studied, CCI provides unique images of linear defects residing below layers of chemically adhered polishing compound. Visualisation of surface strain on sub-nm rms glasses provides supporting evidence for plastic (permanent) deformation of the glass surface at the nanometre level during polishing with certain abrasives and for chemical interactions between the polishing abrasive and glass surface. (C) 2001 Kluwer Academic Publishers.

U2 - 10.1023/A:1012586204236

DO - 10.1023/A:1012586204236

M3 - Article

VL - 36

SP - 5683

EP - 5696

JO - Journal of Materials Science

JF - Journal of Materials Science

SN - 0022-2461

IS - 23

ER -