Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis

R. Ruther, John Livingstone, N. Dytlewski, D. Cohen

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)37 - 42
JournalPhysica Status Solidi A: Applied Research
Volume145
Issue number1
Publication statusPublished - 1994

Cite this

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title = "Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis",
author = "R. Ruther and John Livingstone and N. Dytlewski and D. Cohen",
year = "1994",
language = "English",
volume = "145",
pages = "37 -- 42",
journal = "Physica Status Solidi A: Applied Research",
issn = "0031-8965",
publisher = "Wiley-VCH Verlag GmbH & Co. KGaA",
number = "1",

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Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis. / Ruther, R.; Livingstone, John; Dytlewski, N.; Cohen, D.

In: Physica Status Solidi A: Applied Research, Vol. 145, No. 1, 1994, p. 37 - 42.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis

AU - Ruther, R.

AU - Livingstone, John

AU - Dytlewski, N.

AU - Cohen, D.

PY - 1994

Y1 - 1994

M3 - Article

VL - 145

SP - 37

EP - 42

JO - Physica Status Solidi A: Applied Research

JF - Physica Status Solidi A: Applied Research

SN - 0031-8965

IS - 1

ER -