Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis

R. Ruther, John Livingstone, N. Dytlewski, D. Cohen

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	37 - 42
Journal	Physica Status Solidi A: Applied Research
Volume	145
Issue number	1
Publication status	Published - 1994

Cite this

@article{bc1ed4215b7c43f0a56fdeb4c21ba113,

title = "Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis",

author = "R. Ruther and John Livingstone and N. Dytlewski and D. Cohen",

year = "1994",

language = "English",

volume = "145",

pages = "37 -- 42",

journal = "Physica Status Solidi A: Applied Research",

publisher = "Wiley-VCH Verlag GmbH & Co. KGaA",

number = "1",

}

TY - JOUR

T1 - Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis

AU - Ruther, R.

AU - Livingstone, John

AU - Dytlewski, N.

AU - Cohen, D.

PY - 1994

Y1 - 1994

M3 - Article

VL - 145

SP - 37

EP - 42

JO - Physica Status Solidi A: Applied Research

JF - Physica Status Solidi A: Applied Research

IS - 1

ER -