Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films: An Infrared and Elastic Recoil Analysis

R. Ruther, John Livingstone, N. Dytlewski, D. Cohen

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)37 - 42
JournalPhysica Status Solidi A: Applied Research
Volume145
Issue number1
Publication statusPublished - 1994

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