H2-based dry plasma etching for mesa structuring of HgCdTe

E.P.G. Smith, Charles Musca, D.A. Redfern, John Dell, Lorenzo Faraone

Research output: Contribution to journalArticle

11 Citations (Scopus)
Original languageEnglish
Pages (from-to)853 - 858
JournalJournal of Electronic Materials
Volume29
Issue number6
Publication statusPublished - 2000

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