H2-based dry plasma etching for mesa structuring of HgCdTe

E.P.G. Smith, Charles Musca, D.A. Redfern, John Dell, Lorenzo Faraone

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	853 - 858
Journal	Journal of Electronic Materials
Volume	29
Issue number	6
Publication status	Published - 2000

Cite this

@article{5516c61d87d24deeb83a6b8a038f1eb5,

title = "H2-based dry plasma etching for mesa structuring of HgCdTe",

author = "E.P.G. Smith and Charles Musca and D.A. Redfern and John Dell and Lorenzo Faraone",

year = "2000",

language = "English",

volume = "29",

pages = "853 -- 858",

journal = "Journal of Electronic Materials",

issn = "0361-5235",

publisher = "Springer",

number = "6",

}