Erasure of poling induced second order optical nonlinearities in silica by UV exposure

John Dell, M.J. Joyce, G.O. Stone

Research output: Chapter in Book/Conference paperConference paper

10 Citations (Scopus)
Original languageEnglish
Title of host publicationProceedings of the SPIE - The International Society for Optical Engineering
Place of PublicationSan Diego
PublisherSPIE
Pages185 - 193
Volume2289
Publication statusPublished - 1994
EventErasure of poling induced second order optical nonlinearities in silica by UV exposure -
Duration: 1 Jan 1994 → …

Conference

ConferenceErasure of poling induced second order optical nonlinearities in silica by UV exposure
Period1/01/94 → …

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