Equipment design and control of advanced thermal processing system in lithography

A. Tay, Y. Wang, Hui Chua

Research output: Chapter in Book/Conference paperConference paper

4 Citations (Scopus)
Original languageEnglish
Title of host publicationIECON 2007 33rd Annual Conference of the IEEE
EditorsWen-Nung Lie, Huei-Yung Lin
Place of PublicationUSA
PublisherIEEE, Institute of Electrical and Electronics Engineers
Pagesn/a
Volumen/a
EditionTaipei, Taiwan
Publication statusPublished - 2007
EventEquipment design and control of advanced thermal processing system in lithography - Taipei, Taiwan
Duration: 1 Jan 2007 → …

Conference

ConferenceEquipment design and control of advanced thermal processing system in lithography
Period1/01/07 → …

Cite this

Tay, A., Wang, Y., & Chua, H. (2007). Equipment design and control of advanced thermal processing system in lithography. In W-N. Lie, & H-Y. Lin (Eds.), IECON 2007 33rd Annual Conference of the IEEE (Taipei, Taiwan ed., Vol. n/a, pp. n/a). USA: IEEE, Institute of Electrical and Electronics Engineers.