| Original language | English |
|---|---|
| Title of host publication | IECON 2007 33rd Annual Conference of the IEEE |
| Editors | Wen-Nung Lie, Huei-Yung Lin |
| Place of Publication | USA |
| Publisher | IEEE, Institute of Electrical and Electronics Engineers |
| Pages | n/a |
| Volume | n/a |
| Edition | Taipei, Taiwan |
| Publication status | Published - 2007 |
| Event | Equipment design and control of advanced thermal processing system in lithography - Taipei, Taiwan Duration: 1 Jan 2007 → … |
Conference
| Conference | Equipment design and control of advanced thermal processing system in lithography |
|---|---|
| Period | 1/01/07 → … |
Cite this
Tay, A., Wang, Y., & Chua, H. (2007). Equipment design and control of advanced thermal processing system in lithography. In W-N. Lie, & H-Y. Lin (Eds.), IECON 2007 33rd Annual Conference of the IEEE (Taipei, Taiwan ed., Vol. n/a, pp. n/a). USA: IEEE, Institute of Electrical and Electronics Engineers.