@inproceedings{3a1436005eec4051825694c484a7ebc2,
title = "Equipment design and control of advanced thermal processing system in lithography",
author = "A. Tay and Y. Wang and Hui Chua",
year = "2007",
language = "English",
volume = "n/a",
pages = "n/a",
editor = "Wen-Nung Lie and Huei-Yung Lin",
booktitle = "IECON 2007 33rd Annual Conference of the IEEE",
publisher = "IEEE, Institute of Electrical and Electronics Engineers",
address = "United States",
edition = "Taipei, Taiwan",
note = "Equipment design and control of advanced thermal processing system in lithography ; Conference date: 01-01-2007",
}