Equipment Design and Control of Advanced Thermal-Processing Module in Lithography

A. Tay, Hui Chua, Y.H. Wang, Y.S. Ngo

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Original language	English
Pages (from-to)	1112-1119
Journal	IEEE Transactions on Industrial Electronics
Volume	57
DOIs	https://doi.org/10.1109/TIE.2009.2026230
Publication status	Published - 2010

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title = "Equipment Design and Control of Advanced Thermal-Processing Module in Lithography",

author = "A. Tay and Hui Chua and Y.H. Wang and Y.S. Ngo",

year = "2010",

doi = "10.1109/TIE.2009.2026230",

language = "English",

volume = "57",

pages = "1112--1119",

journal = "IEEE Transactions on Industrial Electronics",

issn = "0278-0046",

publisher = "IEEE, Institute of Electrical and Electronics Engineers",

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TY - JOUR

T1 - Equipment Design and Control of Advanced Thermal-Processing Module in Lithography

AU - Tay, A.

AU - Chua, Hui

AU - Wang, Y.H.

AU - Ngo, Y.S.

PY - 2010

Y1 - 2010

U2 - 10.1109/TIE.2009.2026230

DO - 10.1109/TIE.2009.2026230

M3 - Article

SN - 0278-0046

VL - 57

SP - 1112

EP - 1119

JO - IEEE Transactions on Industrial Electronics

JF - IEEE Transactions on Industrial Electronics

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