Enhanced intermixing in anion and cation sublattices of low-temperature grown GaAs

V. V. Chaldyshev, N. A. Bert, Yu G. Musikhin, A. A. Suvorova, V. V. Preobrazhenskii, M. A. Putyato, B. R. Semyagin, P. Werner

Research output: Chapter in Book/Conference paperConference paperpeer-review

Abstract

Compositional intermixing was studied by transmission electron microscopy of low-temperature (LT) grown GaAs films delta-doped with isovalent In and Sb impurities. The diffusion was found to be enhanced on both anion and cation sublattices of LT GaAs when compared to that for conventional stoichiometric material. The phenomenon seems to be a result of high concentration of excess-arsenic-related point defects. These are gallium vacancies mediating diffusion on gallium sublattice and arsenic interstitials assisting diffusion on arsenic sublattice. The effective In-Ga and Sb-As interdiffusion coefficients and their activation energies have been determined.

Original languageEnglish
Title of host publication2000 International Semiconducting and Insulating Materials Conference, SIMC 2000
EditorsN. J. Welham, C. Jagadish
PublisherIEEE, Institute of Electrical and Electronics Engineers
Pages121-124
Number of pages4
ISBN (Electronic)0780358147
DOIs
Publication statusPublished - 2000
Externally publishedYes
Event11th International Semiconducting and Insulating Materials Conference, SIMC 2000 - Canberra, Australia
Duration: 3 Jul 20007 Jul 2000

Publication series

NameIEEE Semiconducting and Semi-Insulating Materials Conference, SIMC
Volume2000-January

Conference

Conference11th International Semiconducting and Insulating Materials Conference, SIMC 2000
Country/TerritoryAustralia
CityCanberra
Period3/07/007/07/00

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