Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	3-22
Journal	International Journal of Surface Science and Engineering
Volume	3
Issue number	1/2
DOIs	https://doi.org/10.1504/IJSURFSE.2009.024359
Publication status	Published - 2009

Access to Document

@article{186f591c15e14b078de0becba48bc095,

title = "Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation",

author = "Mariusz Martyniuk and Charles Musca and John Dell and R.G. Elliman and Lorenzo Faraone",

year = "2009",

doi = "10.1504/IJSURFSE.2009.024359",

language = "English",

volume = "3",

pages = "3--22",

journal = "International Journal of Surface Science and Engineering",

issn = "1749-785X",

publisher = "Inderscience Enterprises",

number = "1/2",

}

TY - JOUR

T1 - Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation

AU - Martyniuk, Mariusz

AU - Musca, Charles

AU - Dell, John

AU - Elliman, R.G.

AU - Faraone, Lorenzo

PY - 2009

Y1 - 2009

U2 - 10.1504/IJSURFSE.2009.024359

DO - 10.1504/IJSURFSE.2009.024359

M3 - Article

SN - 1749-785X

VL - 3

SP - 3

EP - 22

JO - International Journal of Surface Science and Engineering

JF - International Journal of Surface Science and Engineering

IS - 1/2

ER -