Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation

Mariusz Martyniuk, Charles Musca, John Dell, R.G. Elliman, Lorenzo Faraone

    Research output: Contribution to journalArticle

    4 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)3-22
    JournalInternational Journal of Surface Science and Engineering
    Volume3
    Issue number1/2
    DOIs
    Publication statusPublished - 2009

    Cite this

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    title = "Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation",
    author = "Mariusz Martyniuk and Charles Musca and John Dell and R.G. Elliman and Lorenzo Faraone",
    year = "2009",
    doi = "10.1504/IJSURFSE.2009.024359",
    language = "English",
    volume = "3",
    pages = "3--22",
    journal = "International Journal of Surface Science and Engineering",
    issn = "1749-785X",
    publisher = "Inderscience Enterprises",
    number = "1/2",

    }

    TY - JOUR

    T1 - Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation

    AU - Martyniuk, Mariusz

    AU - Musca, Charles

    AU - Dell, John

    AU - Elliman, R.G.

    AU - Faraone, Lorenzo

    PY - 2009

    Y1 - 2009

    U2 - 10.1504/IJSURFSE.2009.024359

    DO - 10.1504/IJSURFSE.2009.024359

    M3 - Article

    VL - 3

    SP - 3

    EP - 22

    JO - International Journal of Surface Science and Engineering

    JF - International Journal of Surface Science and Engineering

    SN - 1749-785X

    IS - 1/2

    ER -