Dry polyimide etching with controlled sidewall profile for microelectromechanical systems

Research output: Contribution to conferenceAbstract

Original languageEnglish
Publication statusPublished - 2016
Event International Conference on Nanoscience and Nanotechnology (ICONN 2016) - Canberra, Australia
Duration: 7 Feb 201611 Feb 2016

Conference

Conference International Conference on Nanoscience and Nanotechnology (ICONN 2016)
CountryAustralia
CityCanberra
Period7/02/1611/02/16

Cite this

Zawierta, M., Martyniuk, M., Keating, A., Silva, B., Putrino, G., Jeffery, R., & Faraone, L. (2016). Dry polyimide etching with controlled sidewall profile for microelectromechanical systems. Abstract from International Conference on Nanoscience and Nanotechnology (ICONN 2016), Canberra, Australia.
@conference{b8caeeb8adf34fa6bf7a94528871ab75,
title = "Dry polyimide etching with controlled sidewall profile for microelectromechanical systems",
author = "Michal Zawierta and Mariusz Martyniuk and Adrian Keating and Buddhika Silva and Gino Putrino and Roger Jeffery and Lorenzo Faraone",
year = "2016",
language = "English",
note = "International Conference on Nanoscience and Nanotechnology (ICONN 2016) ; Conference date: 07-02-2016 Through 11-02-2016",

}

Zawierta, M, Martyniuk, M, Keating, A, Silva, B, Putrino, G, Jeffery, R & Faraone, L 2016, 'Dry polyimide etching with controlled sidewall profile for microelectromechanical systems' International Conference on Nanoscience and Nanotechnology (ICONN 2016), Canberra, Australia, 7/02/16 - 11/02/16, .

Dry polyimide etching with controlled sidewall profile for microelectromechanical systems. / Zawierta, Michal; Martyniuk, Mariusz; Keating, Adrian; Silva, Buddhika; Putrino, Gino; Jeffery, Roger; Faraone, Lorenzo.

2016. Abstract from International Conference on Nanoscience and Nanotechnology (ICONN 2016), Canberra, Australia.

Research output: Contribution to conferenceAbstract

TY - CONF

T1 - Dry polyimide etching with controlled sidewall profile for microelectromechanical systems

AU - Zawierta, Michal

AU - Martyniuk, Mariusz

AU - Keating, Adrian

AU - Silva, Buddhika

AU - Putrino, Gino

AU - Jeffery, Roger

AU - Faraone, Lorenzo

PY - 2016

Y1 - 2016

UR - http://ausnano.net/iconn2016/

M3 - Abstract

ER -

Zawierta M, Martyniuk M, Keating A, Silva B, Putrino G, Jeffery R et al. Dry polyimide etching with controlled sidewall profile for microelectromechanical systems. 2016. Abstract from International Conference on Nanoscience and Nanotechnology (ICONN 2016), Canberra, Australia.