Magnetron-sputtered layers consisting of carbon and metal (W, Ti, V) were produced with 0-20 at.% metal concentration. The mixed layers were characterised by RBS, SEM, XRD and XPS, and exposed to D3+ ions of 30 eV/D at temperatures between 77 and 1100 K. The chemical erosion yield was investigated by mass spectrometry and RBS. Above RT (∼300 K), the CD4 production yield for pure C layers exhibits a maximum around 750 K, which decreases with increasing metal concentration. For more than ∼3 at.% W, ∼6 at.% V and ∼7 at.% Ti, the maximum vanishes and the CD4 yield continuously diminishes with temperature. A decrease of the activation energy for ion-induced hydrogen release by adding dopants is responsible for the decrease. The CD 4 yield at RT increases depending on metal and concentration, because the distribution of the erosion products is changed. Enrichment of metal on the surface with ion fluence is observed.