Cryogenic optical profilometry for the calculation of coefficient of thermal expansion in thin films

K.L. Brookshire, Ramin Rafiei, Mariusz Martyniuk, Dilusha Silva, John Bumgarner, Robert Basedow, Yinong Liu, Lorenzo Faraone

Research output: Chapter in Book/Conference paperConference paper

1 Citation (Scopus)
Original languageEnglish
Title of host publicationProceedings of SPIE Micro+Nano Materials, Devices, and Applications
Place of PublicationUnited States of America
PublisherSPIE
Pages8923V-1 - 89231V-6
Volume8923
ISBN (Print)0277786X
DOIs
Publication statusPublished - 2013
EventSPIE Micro+Nano Materials, Devices, and Applications 2013 Conference - Melbourne, Australia
Duration: 8 Dec 201311 Dec 2013

Conference

ConferenceSPIE Micro+Nano Materials, Devices, and Applications 2013 Conference
CountryAustralia
CityMelbourne
Period8/12/1311/12/13

Cite this

Brookshire, K. L., Rafiei, R., Martyniuk, M., Silva, D., Bumgarner, J., Basedow, R., ... Faraone, L. (2013). Cryogenic optical profilometry for the calculation of coefficient of thermal expansion in thin films. In Proceedings of SPIE Micro+Nano Materials, Devices, and Applications (Vol. 8923, pp. 8923V-1 - 89231V-6). United States of America: SPIE. https://doi.org/10.1117/12.2033802