| Original language | English |
|---|---|
| Title of host publication | Proceedings of The 7th Asian Control Conference |
| Editors | Y. Hung, W. Su |
| Place of Publication | Hong Kong |
| Publisher | Asian Control Association |
| Pages | 853-858 |
| Volume | 1 |
| Edition | Hong Kong, China |
| ISBN (Print) | 9788995605691 |
| Publication status | Published - 2009 |
| Event | Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography - Hong Kong, China Duration: 1 Jan 2009 → … |
Conference
| Conference | Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography |
|---|---|
| Period | 1/01/09 → … |
Cite this
Tay, A., Chua, H., Wang, Y., & Yang, G. (2009). Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography. In Y. Hung, & W. Su (Eds.), Proceedings of The 7th Asian Control Conference (Hong Kong, China ed., Vol. 1, pp. 853-858). Hong Kong: Asian Control Association.