Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography

A. Tay; Hui Chua; Y. Wang; G. Yang

Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography

A. Tay, Hui Chua, Y. Wang, G. Yang

Chemical Engineering

Research output: Chapter in Book/Conference paper › Conference paper

Original language	English
Title of host publication	Proceedings of The 7th Asian Control Conference
Editors	Y. Hung, W. Su
Place of Publication	Hong Kong
Publisher	Asian Control Association
Pages	853-858
Volume	1
Edition	Hong Kong, China
ISBN (Print)	9788995605691
Publication status	Published - 2009
Event	Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography - Hong Kong, China Duration: 1 Jan 2009 → …

Conference

Conference	Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography
Period	1/01/09 → …

Cite this

@inproceedings{31eb9f19c83f40d4905c8854d4ddaeb0,

title = "Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography",

author = "A. Tay and Hui Chua and Y. Wang and G. Yang",

year = "2009",

language = "English",

isbn = "9788995605691",

volume = "1",

pages = "853--858",

editor = "Y. Hung and W. Su",

booktitle = "Proceedings of The 7th Asian Control Conference",

publisher = "Asian Control Association",

edition = "Hong Kong, China",

note = "Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography ; Conference date: 01-01-2009",

}

Tay, A, Chua, H, Wang, Y & Yang, G 2009, Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography. in Y Hung & W Su (eds), Proceedings of The 7th Asian Control Conference. Hong Kong, China edn, vol. 1, Asian Control Association, Hong Kong, pp. 853-858, Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography, 1/01/09.

Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography. / Tay, A.; Chua, Hui; Wang, Y.; Yang, G.

Proceedings of The 7th Asian Control Conference. ed. / Y. Hung; W. Su. Vol. 1 Hong Kong, China. ed. Hong Kong : Asian Control Association, 2009. p. 853-858.

Research output: Chapter in Book/Conference paper › Conference paper

TY - GEN

T1 - Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography

AU - Tay, A.

AU - Chua, Hui

AU - Wang, Y.

AU - Yang, G.

PY - 2009

Y1 - 2009

M3 - Conference paper

SN - 9788995605691

VL - 1

SP - 853

EP - 858

BT - Proceedings of The 7th Asian Control Conference

A2 - Hung, Y.

A2 - Su, W.

PB - Asian Control Association

CY - Hong Kong

T2 - Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography

Y2 - 1 January 2009

ER -