Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography

A. Tay, Hui Chua, Y. Wang, G. Yang

Research output: Chapter in Book/Conference paperConference paper

Original languageEnglish
Title of host publicationProceedings of The 7th Asian Control Conference
EditorsY. Hung, W. Su
Place of PublicationHong Kong
PublisherAsian Control Association
Pages853-858
Volume1
EditionHong Kong, China
ISBN (Print)9788995605691
Publication statusPublished - 2009
EventControl of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography - Hong Kong, China
Duration: 1 Jan 2009 → …

Conference

ConferenceControl of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography
Period1/01/09 → …

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