Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography

A. Tay, Hui Chua, Y. Wang, G. Yang

Research output: Chapter in Book/Conference paperConference paper

Original languageEnglish
Title of host publicationProceedings of The 7th Asian Control Conference
EditorsY. Hung, W. Su
Place of PublicationHong Kong
PublisherAsian Control Association
Pages853-858
Volume1
EditionHong Kong, China
ISBN (Print)9788995605691
Publication statusPublished - 2009
EventControl of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography - Hong Kong, China
Duration: 1 Jan 2009 → …

Conference

ConferenceControl of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography
Period1/01/09 → …

Cite this

Tay, A., Chua, H., Wang, Y., & Yang, G. (2009). Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography. In Y. Hung, & W. Su (Eds.), Proceedings of The 7th Asian Control Conference (Hong Kong, China ed., Vol. 1, pp. 853-858). Hong Kong: Asian Control Association.