Characterization of Mechanical Properties of Silicon Nitride Thin Films for MEMS Devices by Nanoindentation

H. Huang, Xiao Hu, Yinong Liu, Mark Bush, K.J. Winchester, Charles Musca, John Dell, Lorenzo Faraone

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

An experimental investigation of mechanical properties of thin films using nanoindentation was reported. Silicon nitride thin films with different thicknesses were deposited using plasma enhanced chemical vapor deposition (PECVD) on Si substrate. Nanoindentation was used to measure their elastic modulus and hardness. The results indicated that for a film/substrate bilayer system, the measured mechanical properties are significantly affected by the substrate properties. Empirical formulas were proposed for deconvoluting the film properties from the measured bilayer properties.
Original languageEnglish
Pages (from-to)13-16
JournalJournal of Materials Science and Technology
Volume21
Issue number1
Publication statusPublished - 2005

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