Characterization of low-temperature bulk micromachining of silicon using an SF6/O2 inductively coupled plasma

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	10 pages online
Journal	Journal of Micromechanics and Microengineering
Volume	22
Issue number	9
DOIs	https://doi.org/10.1088/0960-1317/22/9/095005
Publication status	Published - 2012

Access to Document

@article{88fe4c4f83bf490e8a26d0d49022ed82,

title = "Characterization of low-temperature bulk micromachining of silicon using an SF6/O2 inductively coupled plasma",

author = "F. Jiang and Adrian Keating and Mariusz Martyniuk and Krishnamachar Prasad and Lorenzo Faraone and John Dell",

year = "2012",

doi = "10.1088/0960-1317/22/9/095005",

language = "English",

volume = "22",

pages = "10 pages online",

journal = "Journal of Micromechanics and Microengineering",

issn = "0960-1317",

publisher = "IOP Publishing",

number = "9",

}

In: Journal of Micromechanics and Microengineering, Vol. 22, No. 9, 2012, p. 10 pages online.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Characterization of low-temperature bulk micromachining of silicon using an SF6/O2 inductively coupled plasma

AU - Jiang, F.

AU - Keating, Adrian

AU - Martyniuk, Mariusz

AU - Prasad, Krishnamachar

AU - Faraone, Lorenzo

AU - Dell, John

PY - 2012

Y1 - 2012

U2 - 10.1088/0960-1317/22/9/095005

DO - 10.1088/0960-1317/22/9/095005

M3 - Article

VL - 22

SP - 10 pages online

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

SN - 0960-1317

IS - 9

ER -