Characterization of low-temperature bulk micromachining of silicon using an SF6/O2 inductively coupled plasma

F. Jiang, Adrian Keating, Mariusz Martyniuk, Krishnamachar Prasad, Lorenzo Faraone, John Dell

Research output: Contribution to journalArticle

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)10 pages online
JournalJournal of Micromechanics and Microengineering
Volume22
Issue number9
DOIs
Publication statusPublished - 2012

Cite this

@article{88fe4c4f83bf490e8a26d0d49022ed82,
title = "Characterization of low-temperature bulk micromachining of silicon using an SF6/O2 inductively coupled plasma",
author = "F. Jiang and Adrian Keating and Mariusz Martyniuk and Krishnamachar Prasad and Lorenzo Faraone and John Dell",
year = "2012",
doi = "10.1088/0960-1317/22/9/095005",
language = "English",
volume = "22",
pages = "10 pages online",
journal = "Journal of Micromechanics and Microengineering",
issn = "0960-1317",
publisher = "IOP Publishing",
number = "9",

}

TY - JOUR

T1 - Characterization of low-temperature bulk micromachining of silicon using an SF6/O2 inductively coupled plasma

AU - Jiang, F.

AU - Keating, Adrian

AU - Martyniuk, Mariusz

AU - Prasad, Krishnamachar

AU - Faraone, Lorenzo

AU - Dell, John

PY - 2012

Y1 - 2012

U2 - 10.1088/0960-1317/22/9/095005

DO - 10.1088/0960-1317/22/9/095005

M3 - Article

VL - 22

SP - 10 pages online

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

SN - 0960-1317

IS - 9

ER -