Band Switching Si-H Cluster Formation and Hydrogen Effusion upon thermal Annealing in Hydrogenated Amorphous Silica Thin Film

R. Ruther, John Livingstone, J. Dytlewski, D. Cohen

Research output: Contribution to journal › Article › peer-review

Cite this

@article{6f3f74a80b2c46018a6be7d2c05f3946,

title = "Band Switching Si-H Cluster Formation and Hydrogen Effusion upon thermal Annealing in Hydrogenated Amorphous Silica Thin Film",

author = "R. Ruther and John Livingstone and J. Dytlewski and D. Cohen",

year = "1996",

language = "English",

volume = "271",

pages = "151--156",

journal = "Thin Solid Films",

publisher = "Elsevier",

}