A thermoelectricity-lamp based integrated bake/chill system for photoresist processing

A. Tay; Hui Chua; W.S. Ho; Y. Zhou

A thermoelectricity-lamp based integrated bake/chill system for photoresist processing

A. Tay, Hui Chua, W.S. Ho, Y. Zhou

Chemical Engineering

Research output: Chapter in Book/Conference paper › Conference paper › peer-review

Original language	English
Title of host publication	Proceedings of IECON 2005
Editors	Mo-Yuen Chow
Place of Publication	USA
Publisher	IEEE, Institute of Electrical and Electronics Engineers
Pages	153-158
Volume	1
Edition	Raleigh, North Carolina, USA
ISBN (Print)	0780392531
Publication status	Published - 2005
Event	A thermoelectricity-lamp based integrated bake/chill system for photoresist processing - Raleigh, North Carolina, USA Duration: 1 Jan 2005 → …

Conference

Conference	A thermoelectricity-lamp based integrated bake/chill system for photoresist processing
Period	1/01/05 → …

Cite this

@inproceedings{bebcf9b36025452fb7bcecee05870d5a,

title = "A thermoelectricity-lamp based integrated bake/chill system for photoresist processing",

author = "A. Tay and Hui Chua and W.S. Ho and Y. Zhou",

year = "2005",

language = "English",

isbn = "0780392531",

volume = "1",

pages = "153--158",

editor = "Mo-Yuen Chow",

booktitle = "Proceedings of IECON 2005",

publisher = "IEEE, Institute of Electrical and Electronics Engineers",

address = "United States",

edition = "Raleigh, North Carolina, USA",

note = "A thermoelectricity-lamp based integrated bake/chill system for photoresist processing ; Conference date: 01-01-2005",

}

Tay, A, Chua, H, Ho, WS & Zhou, Y 2005, A thermoelectricity-lamp based integrated bake/chill system for photoresist processing. in M-Y Chow (ed.), Proceedings of IECON 2005. Raleigh, North Carolina, USA edn, vol. 1, IEEE, Institute of Electrical and Electronics Engineers, USA, pp. 153-158, A thermoelectricity-lamp based integrated bake/chill system for photoresist processing, 1/01/05.

A thermoelectricity-lamp based integrated bake/chill system for photoresist processing. / Tay, A.; Chua, Hui; Ho, W.S. et al.
Proceedings of IECON 2005. ed. / Mo-Yuen Chow. Vol. 1 Raleigh, North Carolina, USA. ed. USA: IEEE, Institute of Electrical and Electronics Engineers, 2005. p. 153-158.

Research output: Chapter in Book/Conference paper › Conference paper › peer-review

TY - GEN

T1 - A thermoelectricity-lamp based integrated bake/chill system for photoresist processing

AU - Tay, A.

AU - Chua, Hui

AU - Ho, W.S.

AU - Zhou, Y.

PY - 2005

Y1 - 2005

M3 - Conference paper

SN - 0780392531

VL - 1

SP - 153

EP - 158

BT - Proceedings of IECON 2005

A2 - Chow, Mo-Yuen

PB - IEEE, Institute of Electrical and Electronics Engineers

CY - USA

T2 - A thermoelectricity-lamp based integrated bake/chill system for photoresist processing

Y2 - 1 January 2005

ER -