In this study, we perform a simulation analysis to investigate the influence of p-type and n-type doping concentration in BHJ SCs using the drift-diffusion model. Specifically, we investigate the effect of doping on the charge carrier transport and calculate the above-mentioned device parameters. We show that doping the active layer can increase the cell characteristic parameters, that the results are in an excellent agreement with the experimental results previously reported in the literature. We also show that doping causes space charge effects which subsequently lead to redistribution of the internal electric field in the device. Our results reveal that higher doping levels lead to screening the electrical field in the P3HT:PCBM active region. This in turn forces the charge carrier transport to be solely dominated by the diffusion, consequently decreasing the performance of the device. We also show that doping of the active layer to an optimum level can effectively improve the charge transport. Moreover, we show that doping can create an Ohmic contact between the organic and cathode interface. Additionally, the charge carrier concentration profile shows that by increasing the dopant concentration, the Jsc can be improved remarkably. Upon doping the active layer, this indicates that illumination can simply reduce the series resistance in the device.